Progress and Mechanism of Cu Assisted Chemical Etching of Silicon in a Low Cu2+ Concentration Region

标题
Progress and Mechanism of Cu Assisted Chemical Etching of Silicon in a Low Cu2+ Concentration Region
作者
关键词
-
出版物
ECS Journal of Solid State Science and Technology
Volume 4, Issue 8, Pages P331-P336
出版商
The Electrochemical Society
发表日期
2015-07-02
DOI
10.1149/2.0191508jss

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