The dry etching property of TiO2 thin films using metal-insulator-metal capacitor in inductively coupled plasma system

出版年份 2012 全文链接

标题

作者

关键词

出版物

Volume 86, Issue 12, Pages 2152-2157

出版商

Elsevier BV

发表日期

2012-05-31

DOI

10.1016/j.vacuum.2012.05.016

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