X-ray spectroscopic examination of thin HfO2 films ALD- and MOCVD-grown on the Si(100) surface

标题
X-ray spectroscopic examination of thin HfO2 films ALD- and MOCVD-grown on the Si(100) surface
作者
关键词
-
出版物
TECHNICAL PHYSICS
Volume 55, Issue 7, Pages 1045-1050
出版商
Pleiades Publishing Ltd
发表日期
2010-07-22
DOI
10.1134/s1063784210070200

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