期刊
SURFACE SCIENCE
卷 616, 期 -, 页码 198-205出版社
ELSEVIER
DOI: 10.1016/j.susc.2013.05.020
关键词
TiO2; Thin films; XPS; LEED; H2O
资金
- EPSRC (UK)
- European Research Council Advanced Grant (ENERGYSURF)
- Humboldt Research Award
- [COST1104]
- Engineering and Physical Sciences Research Council [EP/C54188X/1] Funding Source: researchfish
- EPSRC [EP/C54188X/1] Funding Source: UKRI
We present a study of the growth and reactivity of ultra-thin films of TiO2 grown on W(100). Three approaches to film growth are investigated, each resulting in films that show order in low-energy diffraction (LEED) and a low level of non-stoichiometry in X-ray photoelectron spectroscopy (XPS). H2O is used as a probe of the reactivity of the films, with changes in the Ti 2p and O 1s core levels being monitored by XPS. Evidence for the dissociation of H2O on the TiO2(110) ultra-thin film surface is adduced. These results are discussed with reference to related studies on native TiO2(110). (C) 2013 Elsevier B.V. All rights reserved.
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