4.7 Article Proceedings Paper

A gigawatt power pulsed ion beam generator for industrial applications

期刊

SURFACE & COATINGS TECHNOLOGY
卷 228, 期 -, 页码 S382-S384

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ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2012.05.094

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Intense ion beam; Material modification; Ion diode with self-magnetic insulation; Infrared imaging diagnostics

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The results of a comprehensive study of a gigawatt level power pulsed ion beam used for material modification are presented. The ion beam is formed using a diode with self-magnetic insulation. The study was performed using the TEMP-4M accelerator in double pulse formation mode. The ion current density is 30-300 A/cm(2) (for different designs of diodes), and the beam is composed of protons (15%) and carbon ions (85%). It was shown that a diode with planar configuration generates an ion beam with a fairly homogeneous energy density over a cross section of 80 cm(2); the energy density is 0.3-0A J/cm(2) and the fluence is 2 x 10(13) cm(-2) per pulse. A diode with focusing geometry forms an ion beam with an energy density of 2-2.5 J/cm(2) at the focus and a pulse energy of 80-100 J. (C) 2012 Elsevier B.V. All rights reserved.

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