期刊
SUPERLATTICES AND MICROSTRUCTURES
卷 51, 期 4, 页码 544-551出版社
ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
DOI: 10.1016/j.spmi.2012.02.003
关键词
Ti-doped ZnO films; Magnetron sputtering; Microstructures; Optical properties
资金
- National Nature Science Foundations of China [11074198]
- Shaanxi Educational Committee [11JK0768]
- Xi'an Shiyou University [YS29030801]
- Doctoral Scientific Research Startup Foundation of Xi'an Shiyou University [YS29031223]
Undoped and Ti-doped ZnO films were deposited using radio frequency reactive magnetron sputtering at various sputtering powers. The crystal structures, surface morphology, chemical state and optical properties in Ti-doped ZnO films were systematically investigated via X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and ultraviolet visible (UV-Vis) spectrophotometer. Results indicated that titanium atoms may replace zinc atomic sites substitutionally or incorporate interstitially in the hexagonal lattices, and a moderate quantity of Ti atoms exist in the form of sharing the oxygen with Zn atoms and hence improve the (002) orientation. The photoluminescence (PL) spectra of the Ti-doped ZnO films contain one main blue peak, whose intensity increased with the increase of sputtering power. Our results indicated that a higher compressive stress in Ti-doped ZnO films results in a lower optical band gap and a lower transmittance, and various Ti impurities can affect the concentration of the interstitial Zn and O vacancies. Crown Copyright (C) 2012 Published by Elsevier Ltd. All rights reserved.
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