Infrared and Raman Study of Amorphous Silicon Carbide Thin Films Deposited by Radiofrequency Cosputtering

标题
Infrared and Raman Study of Amorphous Silicon Carbide Thin Films Deposited by Radiofrequency Cosputtering
作者
关键词
-
出版物
SPECTROSCOPY LETTERS
Volume 47, Issue 5, Pages 392-396
出版商
Informa UK Limited
发表日期
2013-10-09
DOI
10.1080/00387010.2013.840849

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