期刊
SOLAR ENERGY MATERIALS AND SOLAR CELLS
卷 95, 期 10, 页码 2886-2892出版社
ELSEVIER
DOI: 10.1016/j.solmat.2011.06.007
关键词
Thin film solar cells; Light scattering; UV nanoimprint lithography; Pattern fidelity; Texture smoothing; Double texture
We demonstrate the flexibility of UV nanoimprint lithography for effective light trapping in p-i-n a-Si:H/mu c-Si:H tandem solar cells. A textured polymeric layer covered with pyramidal transparent conductive oxide structures is shown as an ideal system to promote front light scattering and thus enhanced photocurrent. The double structure incorporated into micromorph tandem thin film silicon solar cells is systematically investigated in order to find a relationship between interface morphology, optical properties and photovoltaic characteristics. To prevent the formation of defects during cell growth, a controllable smoothing of the imprinted texture is developed. Modules grown on polymer structures smoothed via multi-replication show excellent performance reaching a photocurrent of 12.6 mA/cm(2) and an efficiency of 12.8%. (C) 2011 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据