期刊
SCANNING
卷 34, 期 2, 页码 129-134出版社
WILEY-HINDAWI
DOI: 10.1002/sca.20268
关键词
helium ion microscope; imaging; gas field ion source; neon; sputter; ion milling; vacancy; damage; SRIM; lithography; gas injection system; beam chemistry
The success of the helium ion microscope has encouraged extensions of this technology to produce beams of other ion species. A review of the various candidate ion beams and their technical prospects suggest that a neon beam might be the most readily achieved. Such a neon beam would provide a sputtering yield that exceeds helium by an order of magnitude while still offering a theoretical probe size less than 1-nm. This article outlines the motivation for a neon gas field ion source, the expected performance through simulations, and provides an update of our experimental progress. SCANNING 33: 129134, 2012. (c) 2011 Wiley Periodicals, Inc.
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