Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application

出版年份 2013 全文链接

标题

Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application

作者

关键词

-

出版物

REVIEW OF SCIENTIFIC INSTRUMENTS

Volume 84, Issue 4, Pages 043502

出版商

AIP Publishing

发表日期

2013-04-09

DOI

10.1063/1.4799972

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