A global (volume averaged) model of a chlorine discharge

Plasma etching of Hf-based high-k thin films. Part I. Effect of complex ions and radicals on the surface reactions

(2009) Ryan M. Martin et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

High etching rates of bulk Nb in Ar/Cl2 microwave discharge

(2009) M. Rašković et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Gas temperature measurement in CF4, SF6, O2, Cl2, and HBr inductively coupled plasmas

(2009) G. Cunge et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Investigation of InP etching mechanisms in a Cl2/H2 inductively coupled plasma by optical emission spectroscopy

(2009) L. Gatilova et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

High-aspect-ratio germanium zone plates fabricated by reactive ion etching in chlorine

(2009) Magnus Lindblom et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Mass and Auger electron spectroscopy studies of the interactions of atomic and molecular chlorine on a plasma reactor wall

(2008) Joydeep Guha et al.   JOURNAL OF APPLIED PHYSICS