期刊
PLASMA PROCESSES AND POLYMERS
卷 6, 期 -, 页码 S503-S507出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.200931107
关键词
atmospheric pressure; dielectric barrier discharge (DBD); fluorocarbon films; plasma-enhanced chemical vapour deposition (PE-CVD)
The influence of air and water vapour on the deposition process of fluoropolymers in argon-hexafluoropropene (Ar-C3F6) filamentary dielectric barrier discharges was investigated by adding known concentrations of these contaminants to the feed gas. The obtained results show that Ar-C3F6 DBDs allow in depositing thin films with a XPS F/C ratio as high as 1.7. Under the experimental conditions investigated, contaminant addition slightly affects the F/C ratio of the coatings, and does not cause appreciable O- and N-uptake, but induces a decrease of the deposition rate. Preliminary results from the DES investigation of the gas phase and the GC-MS analysis of the gas effluent are also reported.
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