4.8 Article

Replenish and Relax: Explaining Logarithmic Annealing in Ion-Implanted c-Si

期刊

PHYSICAL REVIEW LETTERS
卷 111, 期 10, 页码 -

出版社

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.111.105502

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  1. NanoQuebec
  2. Fonds quebecois de recherche sur la nature et les technologies
  3. Natural Science and Engineering Research council of Canada
  4. Canada Research Chair Foundation

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We study ion-damaged crystalline silicon by combining nanocalorimetric experiments with an off-lattice kinetic Monte Carlo simulation to identify the atomistic mechanisms responsible for the structural relaxation over long time scales. We relate the logarithmic relaxation, observed in a number of disordered systems, with heat-release measurements. The microscopic mechanism associated with this logarithmic relaxation can be described as a two-step replenish and relax process. As the system relaxes, it reaches deeper energy states with logarithmically growing barriers that need to be unlocked to replenish the heat-releasing events leading to lower-energy configurations.

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