Resistivity of thin Cu films coated with Ta, Ti, Ru, Al, and Pd barrier layers from first principles

标题
Resistivity of thin Cu films coated with Ta, Ti, Ru, Al, and Pd barrier layers from first principles
作者
关键词
-
出版物
PHYSICAL REVIEW B
Volume 81, Issue 4, Pages -
出版商
American Physical Society (APS)
发表日期
2010-01-09
DOI
10.1103/physrevb.81.045406

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