4.6 Article

Ionic liquid based model catalysis: interaction of [BMIM][Tf2N] with Pd nanoparticles supported on an ordered alumina film

期刊

PHYSICAL CHEMISTRY CHEMICAL PHYSICS
卷 12, 期 35, 页码 10610-10621

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c003753b

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资金

  1. Deutsche Forschungsgemeinschaft (DFG)
  2. Fonds der Chemischen Industrie via a Kekule grant
  3. Fonds der Chemischen Industrie
  4. DFG
  5. DAAD
  6. European Union

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Towards a better understanding of novel catalytic materials consisting of supported noble metal catalysts modified by an ionic liquid (IL) film, we have performed a study under ultrahigh-vacuum (UHV) conditions. The model surface consists of Pd nanoparticles grown in UHV on an ordered alumina film on NiAl(110). Thin films of the room temperature IL 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide [BMIM][Tf2N] are deposited onto this surface by means of physical vapor deposition (PVD). The interaction of the IL with clean and CO-covered Pd/Al2O3/NiAl(110) at 300 K and the thermal behavior of the deposited IL films on Pd/Al2O3/NiAl(110) are investigated by time-resolved infrared reflection absorption spectroscopy (TR-IRAS) and X-ray photoelectron spectroscopy (XPS). At 300 K, the IL adsorbs molecularly both onto the Pd particles and onto the alumina. The IR spectra suggest that the [Tf2N](-) anions interact with Pd sites preferentially via the sulfonyl groups. CO pre-adsorbed on the Pd particles is partially displaced by the IL, even at 300 K, and only the part of CO adsorbed onto hollow sites on (111) facets of the Pd particles remains in place. Upon heating to temperatures higher than the desorption temperature of the IL (> 400 K), molecular desorption of the IL competes with decomposition. The decomposition products, atomic species and small fragments, remain preferentially adsorbed onto the Pd nanoparticles and strongly modify their surface properties. Most of the decomposition products originate from the [BMIM](+) cations, whereas the [Tf2N](-) anions desorb for the most part.

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