Homoepitaxial growth of high-quality nonpolar ZnO films by MOCVD and evaluation of the homoepitaxial ZnO films by XRD measurement for asymmetric planes

标题
Homoepitaxial growth of high-quality nonpolar ZnO films by MOCVD and evaluation of the homoepitaxial ZnO films by XRD measurement for asymmetric planes
作者
关键词
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出版物
出版商
Wiley
发表日期
2009-04-21
DOI
10.1002/pssa.200881305

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