β-Ta and α-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas

标题
β-Ta and α-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas
作者
关键词
-
出版物
PHYSICA B-CONDENSED MATTER
Volume 439, Issue -, Pages 3-8
出版商
Elsevier BV
发表日期
2013-11-28
DOI
10.1016/j.physb.2013.11.038

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