期刊
PHYSICA B-CONDENSED MATTER
卷 405, 期 18, 页码 3875-3878出版社
ELSEVIER
DOI: 10.1016/j.physb.2007.02.100
关键词
NiOx thin films; Optical constants; Optical band gap; Film thickness; Annealing
资金
- National High Technology Development Program [2004AA31G230]
- National Natural Science Foundation of China [50672108, 60644002]
NiOx (x > 1) thin films were deposited by reactive DC-magnetron sputtering from a nickel metal target in Ar+O-2 with the relative 02 content 5%. The reflectivity and transmission of the films were measured from 350 to 700 nm. The films coated to thicknesses of 17, 27 and 34 nm had the same absorption mechanism which is a direct allowed transition. The refractive index n and extinction coefficient k of the films were calculated from the measured reflectivity and transmission of these films, and the relationship of the optical band gap with variation in film thickness was studied as well. All results showed that the optical properties of NiOx thin films depended on the film thickness. (C) 2010 Elsevier B.V. All rights reserved.
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