4.6 Article

Onset voltage shift in the organic thin-film transistor with an atomic-layer-deposited charge-injection interlayer

期刊

ORGANIC ELECTRONICS
卷 62, 期 -, 页码 248-252

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.orgel.2018.08.004

关键词

Organic thin-film transistor; Atomic layer deposition; On-set voltage; Vanadium oxide

资金

  1. Guangdong Natural Science Funds for Distinguished Young Scholar [2015A030306036]
  2. Shenzhen Science and Technology Research Grant [GRCK2017042414370236]

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High contact resistance at metal/organic interface is a general issue for organic thin-film transistors (OTFTs). We show that inserting an ultrathin vanadium oxide (VOx) interlayer by atomic layer deposition (ALD) at the metal/organic interface can greatly reduce the contact resistance and enhance the performance of pentacene OTFTs. When the ALD of VOx is performed at a relatively low temperature of 50 degrees C, the prepared transistor also exhibits a pronounced shift in onset voltage for several volts. The origin of this onset voltage shift is identified as the adsorption of dimethylamine, which is a byproduct of the ALD VOx process. We further show that the adsorption of dimethylamine can be well eliminated by elevating the ALD process temperature to 100 degrees C, which therefore offers a simple and straightforward approach to circumvent the issues with the onset voltage shift.

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