Hybrid lithography: Combining UV-exposure and two photon direct laser writing

标题
Hybrid lithography: Combining UV-exposure and two photon direct laser writing
作者
关键词
-
出版物
OPTICS EXPRESS
Volume 21, Issue 24, Pages 29921
出版商
The Optical Society
发表日期
2013-11-27
DOI
10.1364/oe.21.029921

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