期刊
OPTICS EXPRESS
卷 18, 期 15, 页码 15975-15980出版社
OPTICAL SOC AMER
DOI: 10.1364/OE.18.015975
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资金
- National Natural Science Foundation of China [60878031]
- National Basic Research Program of China [2006CD302902]
For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside-exposure method are studied and the interference fringes with feature size below 65nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid. (C) 2010 Optical Society of America
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