100 nm period grating by high-index phase-mask immersion lithography

标题
100 nm period grating by high-index phase-mask immersion lithography
作者
关键词
-
出版物
OPTICS EXPRESS
Volume 18, Issue 10, Pages 10557
出版商
The Optical Society
发表日期
2010-05-12
DOI
10.1364/oe.18.010557

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