期刊
OPTICS EXPRESS
卷 18, 期 2, 页码 700-712出版社
OPTICAL SOC AMER
DOI: 10.1364/OE.18.000700
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资金
- EC [II-20022049]
- Foundation for Fundamental Research on Matter (Stichting voor Fundamenteel Onderzoek der Materie, FOM)
- Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)
- Ministry of Science and Higher Education of Poland [DESY/68/2007]
- Czech Ministry of Education [LC510, LC528]
- INGO [LA08024]
- Czech Science Foundation [202/08/H057]
- Academy of Sciences of the Czech Republic [Z10100523, IAA400100701, KAN300100702]
- Lawrence Livermore National Laboratory [DE-AC52-07NA27344]
- German Federal Ministry of Education and Research [05 KS7PG1]
We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and post-mortem by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources. (C)2010 Optical Society of America
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