期刊
OPTICS EXPRESS
卷 16, 期 18, 页码 13857-13870出版社
OPTICAL SOC AMER
DOI: 10.1364/OE.16.013857
关键词
-
类别
资金
- MOE Academic Research Fund [3/08]
- NTU-Chartered-EDB fund
In this paper, fabrication of nano-scale 3-D features by total internal reflection generated single exposure counter propagating multiple evanescent waves interference lithography (TIR-MEWIL) in a positive tone resist is investigated numerically. Using a four incident plane waves configuration from an 364nm wavelength illumination source, the simulated results indicate that the proposed technique shows potential in realizing periodic surface relief features with diameter as small as 0.08 lambda and height-to-diameter aspect ratio as high as 10. It is also demonstrated that the sensitivity of multiple evanescent waves' interference depends on the polarization and phase of the incident plane waves, and can be tailored to obtain different geometry features. A modified cellular automata algorithm has been employed to simulate three-dimensional photoresist profiles that would result from exposure to the studied evanescent waves interference configurations. (c) 2008 Optical Society of America.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据