期刊
OPTICAL MATERIALS
卷 35, 期 8, 页码 1564-1570出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.optmat.2013.03.027
关键词
Zinc oxide; Pulsed laser deposition; Temperature of growth
资金
- RFBR [11-07-00359-a, 11-07-12050-ofi-m-2011, 12-07-00301-a, 12-08-00642-a, 11-02-92478-MNTI-a, 12-02-33022-mol-a-ved]
The dependence has been investigated of electrical, optical and structural properties of undoped ZnO films grown on single-crystal c-sapphire substrates by pulsed laser deposition on the substrate temperature in the range between 50 degrees C and 650 degrees C. It has been shown,that an increase in energy density of laser radiation at the target surface leads to lowering of the temperature of epitaxial growth of zinc oxide films. The surface roughness of the films produced at the substrate temperature of 450 degrees C does not exceed several monolayers, and the width of X-ray diffraction peaks 2 Theta at half maximum near the lattice site (00.2) makes 0.035 degrees. (C) 2013 Elsevier B.V. All rights reserved.
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