期刊
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
卷 269, 期 20, 页码 2184-2188出版社
ELSEVIER
DOI: 10.1016/j.nimb.2011.02.043
关键词
Ion microbeam; TIARA; Micro-PIXE; Single ion hit; PBW; Accelerator
类别
资金
- Grants-in-Aid for Scientific Research [21360154] Funding Source: KAKEN
Since 1990 R&Ds of microbeam technology has been progressed at the TIARA facility of JAEA Takasaki. In order to meet a wide variety of ion beam applications, analysis, radiation effect studies, or fabrication in regions of micro- or nano-structures, three different types of ion microbeam systems were developed. In these systems, high-spatial resolutions have been achieved and techniques of micro-PIXE, single ion hit and particle beam writing (PBW) were also developed for these applications. Microbeams, on the other hand, require the highest quality of beams from the accelerators, the cyclotron in particular, which was an important part of the microbeam technology of TIARA. In this paper, the latest progress of the ion microbeam technology and applications are summarized and a future prospect of them is discussed. (C) 2011 Elsevier B.V. All rights reserved.
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