期刊
NANOTECHNOLOGY
卷 24, 期 5, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/24/5/055304
关键词
-
资金
- NSERC
- MITACS Canada
Replication of surface nano-structures from a master stamp allows large-area volume production that is otherwise cost prohibitive through conventional direct-write methods, such as electron beam lithography and focused ion beam milling. However, the creation of a master stamp containing sophisticated patterns still requires significant time on such direct-write tools. We demonstrate a method for reducing this tool time by patterning smaller nano-structures, and then enlarging them to the desired size through isotropic etching. We can create circular structures of any arrangement and size, down to the patterning limits of the direct-write tools. Subsequent metal mask deposition, lift-off, and anisotropic etching transforms the circular patterns to out-of-plane pillar structures for the final stamp. A 1 cm(2) area filled with a pattern of 200 nm diameter nano-holes spaced 520 nm apart, requires only 21 h to complete using our process, compared to 75 h using conventional fabrication. We demonstrate the utility and practicality of the quartz stamps through polymer embossing and replication. Embossed polymer nano-hole arrays are coated with a Cr/Au (5/100 nm) film to create surface plasmon resonance structures. Extraordinary optical transmission spectra from the metallized arrays show the expected spectral features when compared to focused ion beam milled structures.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据