Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask

标题
Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask
作者
关键词
-
出版物
Nanoscale Research Letters
Volume 4, Issue 4, Pages 364-370
出版商
Springer Nature
发表日期
2009-01-24
DOI
10.1007/s11671-009-9255-4

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