Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning

标题
Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning
作者
关键词
-
出版物
Nanoscale
Volume 3, Issue 7, Pages 2730
出版商
Royal Society of Chemistry (RSC)
发表日期
2011-04-19
DOI
10.1039/c1nr10050e

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