Article
Physics, Applied
Gakuto Kagawa, Takumi Sugimoto, Hidetoshi Takahashi
Summary: This paper presents a new approach for inclined UV lithography based on liquid immersion. By utilizing liquid immersion, structures can be formed with larger inclination angles. The researchers developed the necessary equipment and successfully fabricated 3D microstructures. The results showed exposures beyond the limits of conventional inclined UV lithography.
APPLIED PHYSICS EXPRESS
(2022)
Article
Optics
Jianwen Gong, Ji Zhou, Haifeng Sun, Song Hu, Jian Wang, Junbo Liu
Summary: This paper presents a novel method for fabricating microlens arrays using projection lithography with mask-shifting. By using a special projection objective lens and a filtering technique, the method achieves high surface figure accuracy and low surface roughness. The experimental results demonstrate the potential of this method in microlens array fabrication.
Article
Chemistry, Physical
Chuanlong Guan, Jinkui Chu, Ran Zhang
Summary: The interfacial properties of the resist/mold in UV-NIL have a significant impact on the surface morphology of nanopatterns. Increasing crosslinking conversion leads to decreased interfacial energy but higher stress during interfacial separation. Introducing a traction-separation description can better simulate the stress distribution at the interface. Appropriately reducing the crosslinking conversion can limit the interfacial stress and maintain the desired morphology.
APPLIED SURFACE SCIENCE
(2023)
Review
Chemistry, Analytical
Pooria Golvari, Stephen M. Kuebler
Summary: This review surveys the advances in fabricating functional microdevices using multi-photon lithography (MPL) with the SU-8 material system, focusing on the progress made in the last five years and discussing methods for improving resolution and functionalizing structures after fabrication.
Article
Chemistry, Physical
Lei Wu, Yewei Ren, Huaicheng Zhou, Yu Lin, Renxing Liu, Linmao Qian, Bingjun Yu
Summary: This study proposed a novel double-layer rotational symmetry cantilever (DRSC)-based probe lithography for the facile and cost-effective fabrication of large-area, sensitive, and reproducible SERS substrates. The DRSC architecture was optimized and its strength and fatigue were assessed using finite element simulation. The proposed lithography exhibited identical stiffness in all horizontal directions and achieved high-precision fabrication under high-speed reciprocating processes. SERS spectra of malachite green (MG) showed impressive enhancement, excellent stability, and high reproducibility, and practical applications of the prepared SERS substrates were demonstrated.
APPLIED SURFACE SCIENCE
(2023)
Article
Nanoscience & Nanotechnology
Zhimin Zhang, Qingwang Meng, Ningning Luo
Summary: A method for high fidelity fabrication of curved microstructures using DMD based dynamical ultraviolet lithography is proposed in this study. The method replaces the nonlinear modulation of DMD in gray-scale lithography with linear binary modulation, improving the dynamical modulation range of the DMD. The experimental results demonstrate effective decrease in fabrication deviation in the edge region of the fabricated curved microstructures, showing great potential for precision and low-cost industrial production.
Article
Polymer Science
Demei Lee, Ya-Ling Tang, Shih-Jung Liu
Summary: Nanofeatured polymeric films were successfully fabricated using nanosphere lithography and UV soft-mold roller embossing, showcasing their application in solar cells. Empirical outcomes demonstrate that UV soft-mold roller embossing offers a simple yet potent way of producing nanofeatured films, with different processing variables influencing the reproducibility of the films.
Article
Engineering, Electrical & Electronic
Saaya Senzaki, Takao Okabe, Jun Taniguchi
Summary: In this study, a two-step lithography method combining UV-NIL and EBL is proposed to fabricate a bifocal lens with a microlens array and a concentric-circle microlens having different focal points.
MICROELECTRONIC ENGINEERING
(2022)
Article
Engineering, Electrical & Electronic
Sung-il Chung, Pan Kyeom Kim, Tae-gyu Ha
Summary: Screen printing has various industrial applications due to its simple process and low production cost. The study introduces a novel method for fabricating a hybrid fine metal mask (HFMM) to enable the screen printing of fine electrode patterns. The HFMM combines the advantages of conventional screen mask and metal stencils, and can be used to fabricate various functional electrodes.
MICROELECTRONIC ENGINEERING
(2021)
Article
Chemistry, Physical
E. Cheng, Suzhou Tang, Lingpeng Liu, Helin Zou, Zhengyan Zhang
Summary: UV lithography parameters were optimized to achieve a significant decrease in the width dimension of photoresist patterns from microscale to nano-scale. The influences of etching time on SiO2 film over-etching amount and nano-mold depth were analyzed to further reduce the width of nano-mold. Additionally, the effect of photoresist mesas deformation on nano-mold fabrication was studied to improve the quality of nano-mold.
SURFACE REVIEW AND LETTERS
(2021)
Proceedings Paper
Materials Science, Multidisciplinary
Qiang Fu, Hadi Amata, Benjamin Gerard, Christian Marois, Wolfgang Heidrich
Summary: An additive lithographic fabrication process for a reflective Tilt-Gaussian-Vortex (TGV) mask is proposed in this work, which eliminates the error-prone RIE step after lithography and instead uses a sputter deposition and bi-layer liftoff step to form microstructures. The combination of sputter deposition and liftoff results in high surface quality and depth accuracy across the whole wafer area. This fabrication method has been demonstrated effective in producing uniform depth and surface roughness control for both Gaussian and Vortex patterns.
Proceedings Paper
Optics
Abdollah Pil-Ali, Sahar Adnani, Pranav Gavirneni, Seokjee Shin, Bahareh Sadeghimakki, Mahla Poudineh, William Wong, Karim S. Karim
Summary: High-aspect ratio x-ray absorption gratings are required for hard x-ray or high-resolution soft x-ray phase-contrast imaging applications. This study presents a design and fabrication process to fabricate high-aspect ratio gratings through a self-aligned hard-mask. The proposed method overcomes the limitations of conventional fabrication processes and allows for the production of high-aspect ratio fine x-ray gratings with large field-of-view.
MEDICAL IMAGING 2022: PHYSICS OF MEDICAL IMAGING
(2022)