Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices

标题
Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices
作者
关键词
-
出版物
MICROELECTRONIC ENGINEERING
Volume 114, Issue -, Pages 70-77
出版商
Elsevier BV
发表日期
2013-10-11
DOI
10.1016/j.mee.2013.09.018

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now