Post-etch residue removal using choline chloride–malonic acid deep eutectic solvent (DES)

标题
Post-etch residue removal using choline chloride–malonic acid deep eutectic solvent (DES)
作者
关键词
-
出版物
MICROELECTRONIC ENGINEERING
Volume 102, Issue -, Pages 81-86
出版商
Elsevier BV
发表日期
2011-12-08
DOI
10.1016/j.mee.2011.11.014

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