4.4 Article

Defect-assisted tunneling current-transport mechanism for Schottky diodes of Pt thin film on p-SiNWs tips

期刊

MICROELECTRONIC ENGINEERING
卷 103, 期 -, 页码 36-41

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2012.09.017

关键词

Silicon nanowires; Schottky diodes; Current-transport mechanism; Defect-assisted tunneling; Thermionic emission; Generation-recombination; Leakage

资金

  1. National Natural Science Foundation of China [60672002, 61076070, 61071086, 61204018]
  2. Education Committee of Jiangsu Province [11KJB510023]
  3. Science and Technology Projects of Nantong [BK2012044, BK2011012, BK2011024]

向作者/读者索取更多资源

The Schottky diodes of a Platinum (Pt) thin film on p-silicon nanowires (p-SiNWs) tips were fabricated. The current-transport mechanism of Pt/p-SiNWs Schottky diodes was defect-assisted tunneling (TU). Each silicon nanowire could be seen as a core/shell structure with a monocrystalline silicon core wrapped by a thin natural amorphous silicon oxide shell, which induced a large number of defects and enhanced the defect-assisted tunneling probability. The experimental I-V data were fitted to the theoretical mode of the thermionic emission (TE), generation-recombination (GR), TU, and leakage (RL) current-transport mechanisms in the temperature range of 300-370 K and voltage range of -1 to 1 V. The TU fitting data were in excellent agreement with the experimental data. Meanwhile, the tunneling parameter (E-0) was independent of the temperature, which closely followed the TU current-transport mechanism. Defect-assisted tunneling mechanism of Pt/p-SiNWs Schottky diodes could be applied to many other Schottky junction devices, especially, for low-dimensional nanostructures. (C) 2012 Elsevier B.V. All rights reserved.

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