4.4 Article Proceedings Paper

Thermoelectric properties of n-type Bi-Te thin films with various compositions

期刊

MICROELECTRONIC ENGINEERING
卷 88, 期 5, 页码 593-596

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ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2010.06.019

关键词

Thermoelectric thin film; Bi-Te; RF co-sputtering; Combinatorial method

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Bismuth-telluride-based materials have excellent room-temperature thermoelectric properties. In this study, the composition of Bi-Te thin films deposited by RF-magnetron sputtering was systematically varied across a single wafer. X-ray diffraction, field emission-scanning electron microscopy (FE-SEM, JEOL, JSM-7000F) and energy dispersive X-ray spectroscopy (EDS) were then used to investigate the thermoelectric properties of the Bi-Te films as a function of the Te fraction. The Te content of the films ranged from 38% to 81%, and their microstructure and crystal structure varied depending on the Te content. The Seebeck coefficients of the Bi-Te thin films were in the range -10 to 153 mu V/K, and the maximum power factor of the films was 3.7 x 10(-4) W/K-2 m, without post annealing. (C) 2010 Elsevier B.V. All rights reserved.

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