期刊
MICROELECTRONIC ENGINEERING
卷 86, 期 4-6, 页码 556-560出版社
ELSEVIER
DOI: 10.1016/j.mee.2008.12.081
关键词
Focused ion beam sputtering; Continuous slicing method; Microscale mould; Spiral scan; Polymer replication
Focused ion beam sputtering was used to fabricate microscale moulds of circular conical structures in silicon. As scan strategy, a continuous slicing method (CSM) modified from a two-dimensional (2D) slice-by-slice approach combined with a spiral scan was tested experimentally. With carefully chosen ion beam conditions and processing parameters, moulds were fabricated as a function of the ion dose for specific dwell times. Using the fabricated moulds, polymeric polydimethylsiloxane (PDMS) and polyurethane acrylate (PUA) microstructures were replicated and compared with the mould dimensions. Using PUA, the resolution of the polymer structure was examined on a nanoscale. In addition, mould-making failure due to both beam overlap and the field of view (FOV) is discussed. Finally, micro-lenses of different sizes were fabricated successfully. (C) 2009 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据