期刊
MICROELECTRONIC ENGINEERING
卷 86, 期 7-9, 页码 1965-1968出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2009.02.036
关键词
Piezoresistive coefficient; Silicon-on-insulator MOSFET; Mobility
This paper reports the piezoresistive coefficients of silicon-on-insulator (SOI) n-/p- MOSFETs of 0.135/0.45/10 mu m channel length by 10 mu m channel width. The dynamic transconductance and normalized saturation current changes were measured with the channels of longitudinal and transverse configurations under maximum stress of 45.7 MPa. The coefficients consist of the tendency of other works using bulk Si and Si MOSFETs but shows significant drain/source parasitic resistance effect for the SOI MOSFETs with 0.135 mu m channel length. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.
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