The progress and challenges of threshold voltage control of high-k/metal-gated devices for advanced technologies (Invited Paper)

标题
The progress and challenges of threshold voltage control of high-k/metal-gated devices for advanced technologies (Invited Paper)
作者
关键词
-
出版物
MICROELECTRONIC ENGINEERING
Volume 86, Issue 7-9, Pages 1722-1727
出版商
Elsevier BV
发表日期
2009-03-20
DOI
10.1016/j.mee.2009.03.092

向作者/读者发起求助以获取更多资源

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started