Deposition of HfO2 on InAs by atomic-layer deposition

标题
Deposition of HfO2 on InAs by atomic-layer deposition
作者
关键词
-
出版物
MICROELECTRONIC ENGINEERING
Volume 86, Issue 7-9, Pages 1561-1563
出版商
Elsevier BV
发表日期
2009-03-20
DOI
10.1016/j.mee.2009.03.091

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