Improved etching method for microelectronic devices with supercritical carbon dioxide

标题
Improved etching method for microelectronic devices with supercritical carbon dioxide
作者
关键词
-
出版物
MICROELECTRONIC ENGINEERING
Volume 86, Issue 2, Pages 128-131
出版商
Elsevier BV
发表日期
2008-10-19
DOI
10.1016/j.mee.2008.10.003

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