Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.