Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN)

出版年份 2008 全文链接

标题

作者

关键词

出版物

Volume 85, Issue 12, Pages 2425-2429

出版商

Elsevier BV

发表日期

2008-10-03

DOI

10.1016/j.mee.2008.09.039

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