Effect of Negative Substrate Bias Voltage on the Nucleation and Growth of Cu Films during the Initial Stage of Ion Beam Deposition

标题
Effect of Negative Substrate Bias Voltage on the Nucleation and Growth of Cu Films during the Initial Stage of Ion Beam Deposition
作者
关键词
-
出版物
METALS AND MATERIALS INTERNATIONAL
Volume 14, Issue 3, Pages 381-384
出版商
Springer Nature
发表日期
2008-06-30
DOI
10.3365/met.mat.2008.06.381

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