期刊
METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE
卷 45A, 期 11, 页码 5017-5028出版社
SPRINGER
DOI: 10.1007/s11661-014-2434-7
关键词
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资金
- National Natural Science Foundation of China [50671062]
- Baoshan Iron & Steel Co., Ltd.
- US National Science Foundation [NSF DMR-1210437]
- China Scholarship Council [201306230030]
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [1210437] Funding Source: National Science Foundation
To provide insight into the microstructural evolution and mechanical behavior of bulk nanostructured Ti, we used cold gas dynamic spraying of Ti particles to synthesize thick coatings (e.g., > 10 mm in thickness). Accordingly, the grain size, lattice parameter, lattice strain, residual stress, porosity, microhardness, tensile, and compressive behavior of the bulk Ti deposits before and after annealing were comparatively analyzed. Our results show that the microstructure of the as-sprayed bulk Ti was characterized by a grain size of similar to 60 nm, lattice expansion (similar to 2 pct for and similar to 3 pct for ), lattice strain (similar to 1.65 x 10(-5)), and residual compressive stress (similar to 53 MPa). Moreover, annealing of the as-deposited bulk Ti led to a significant decrease in lattice expansion, lattice strain, and residual stress, whereas porosity remained unchanged (similar to 11 pct). The mechanisms of grain growth, as well as the evolution of particle interfaces during annealing, were also investigated. In terms of mechanical behavior, the as-deposited bulk Ti exhibited a very low modulus (52 GPa) with relatively high tensile and compressive strength values (180 and 850 MPa, respectively). Annealing in the temperature range of 1023 K to 1173 K (750 A degrees C to 900 A degrees C) led to a significant increase of tensile and compressive strength (to 380 MPa and more than 1200 MPa, respectively). Finally, annealing resulted in a slight increase of elastic modulus, which was rationalized on the basis of changes in pore geometry in the bulk Ti deposits.
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