期刊
MATERIALS RESEARCH BULLETIN
卷 109, 期 -, 页码 175-182出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.materresbull.2018.09.038
关键词
Carbides; Optical materials; Plasma deposition; X-ray diffraction
BxC thin films were deposited on silicon (100) and sodalime glass substrates using Radio Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD) technique, at different substrate self-bias varying from -100V to -250V. Optical property, structure and stoichiometry of the films were determined by spectrophotometry, X-ray diffraction and proton elastic backscattering spectrometric measurements respectively to investigate the effect of film composition on microstructure and optical properties. Film refractive index at a typical wavelength of 400 nm increased from 1.87 to 1.97 on account of increasing packing density of the films with substrate self- bias. Decrease in direct and indirect optical band gap with increasing substrate self-bias, has been explained on the basis of compositional variation i.e. boron/carbon stoichiometric ratio. Finally, soft X-ray reflectivity in the wavelength range of 40 angstrom-360 angstrom has been measured to explore its potential for application as optical material in this region of electromagnetic spectrum.
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