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Low and moderate dose gamma-irradiation and annealing impact on electronic and electrical properties of AlGaN/GaN high electron mobility transistors

期刊

RADIATION EFFECTS AND DEFECTS IN SOLIDS
卷 170, 期 5, 页码 377-385

出版社

TAYLOR & FRANCIS LTD
DOI: 10.1080/10420150.2015.1010170

关键词

wide-band-gap semiconductors; high electron mobility transistors; activation energy; diffusion length; gamma irradiation

资金

  1. NATO [9844662]
  2. U.S. DOD HDTRA [1-11-1-0020]

向作者/读者索取更多资源

To understand the effects of Co-60 gamma-irradiation, systematic studies were carried out on n-channel AlGaN/GaN high electron mobility transistors. Electrical testing, combined with electron beam-induced current measurements, was able to provide critical information on defects induced in the material as a result of gamma-irradiation. It was shown that at low gamma-irradiation doses, the minority carrier diffusion length in AlGaN/GaN exhibits an increase up to approximate to 300Gy. The observed effect is due to longer minority carrier (hole) life time in the material's valence band as a result of an internal electron irradiation by Compton electrons. However, for larger doses of gamma irradiation (above 400Gy), deteriorations in transport properties and device characteristics were observed. This is consistent with the higher density of deep traps in the material's forbidden gap induced by a larger dose of gamma-irradiation. Moderate annealing of device structures at 200 degrees C for 25min resulted in partial recovery of transport properties and device performance.

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