Atom Probe Tomography Characterization of Thin Copper Layers on Aluminum Deposited by Galvanic Displacement

标题
Atom Probe Tomography Characterization of Thin Copper Layers on Aluminum Deposited by Galvanic Displacement
作者
关键词
-
出版物
LANGMUIR
Volume 28, Issue 3, Pages 1673-1677
出版商
American Chemical Society (ACS)
发表日期
2012-01-06
DOI
10.1021/la204156d

向作者/读者发起求助以获取更多资源

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started