Dual-Stage Lithography from a Light-Driven, Plasmon-Assisted Process: A Hierarchical Approach to Subwavelength Features

标题
Dual-Stage Lithography from a Light-Driven, Plasmon-Assisted Process: A Hierarchical Approach to Subwavelength Features
作者
关键词
-
出版物
LANGMUIR
Volume 28, Issue 30, Pages 10957-10961
出版商
American Chemical Society (ACS)
发表日期
2012-07-18
DOI
10.1021/la301728r

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