Reactive sputtering of substoichiometric Ta2Ox for resistive memory applications

标题
Reactive sputtering of substoichiometric Ta2Ox for resistive memory applications
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 32, Issue 2, Pages 021501
出版商
American Vacuum Society
发表日期
2013-11-05
DOI
10.1116/1.4828701

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