Addition of yttrium into HfO2 films: Microstructure and electrical properties

标题
Addition of yttrium into HfO2 films: Microstructure and electrical properties
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 27, Issue 3, Pages 503-514
出版商
American Vacuum Society
发表日期
2009-05-03
DOI
10.1116/1.3106627

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