Nanoimprinting of dielectric loaded surface-plasmon-polariton waveguides using masters fabricated by 2-photon polymerization technique

We report on a method of making dielectric loaded surface-plasmon-polariton waveguides by nanoimprint lithography from master structures fabricated using two-photon polymerization. This method employing molds from polydimethylsiloxane allows rapid reproduction of waveguide structures using a large variety of resist and substrate materials. Both master and imprinted samples are characterized and compared. Measurements are performed on the imprinted samples using leakage radiation microscopy (c) 2009 Optical Society of America